Description
ANSURE PHOTO is a company which has a wealth of experience in the field of silicon optical components processing, especially good at processing all types of scanning galvanometer and high precision with complex shape component.
Silicon is widely used in laser reflection systems because of its light weight, fast heat dissipation, excellent crystal quality and easy manufacture of high quality surface and finish.
Laser Marking
| Name | Scanning galvanometer |
| Material | Czochralski silicon |
| Type | P or N |
| Purity | 5N–6N |
| Orientation | <100>or<111> |
| Tolerance | ±0.02—±0.1mm |
| Chamfering | C0.3-0.5×45° |
| Depth of parallelism | <0.02mm |
| 1 | Parallelism | <3 arc minutes |
| 2 | Flatness | 1/4λ-10λper inch @633nm |
| 3 | Surface quality | 5-10/60-40 |
| 4 | Tolerance | ±0.02-±0.1 |
| 5 | Chamfer | 0.1-0.5*45°C |
| Dimension L*W*T (mm) | Substrate | Beam Size |
| 8.4×11.5×1.05 | Si | 5 |
| 9x12x1.05 | Si | 5 |
| 12.6x15x1.7 | Si | 8 |
| 10.6×25.4×1.7 | Si | 8 |
| 13.7×20.3×2 | Si | 10 |
| 13.69×20.32×1.5 | Si | 10 |
| 20x25x2 | Si | 12 |
| 19x32x2 | Si | 12 |
| 17.78×24.43×1.5 | Si | 12 |
| 17.2×22.5×1.2 | Si | 12 |
| 24.8×39.4×3.2 | Si | 16 |
| 23x34x2 | Si | 16 |
| 23x30x2 | Si | 16 |
| 21x30x2 | Si | 16 |
| 30x35x2 | Si | 20 |
| 27x32x2 | Si | 20 |
| 25x30x2 | Si | 20 |
| 35x45x2 | Si | 25 |
| 34x55x4 | Si | 25 |
| 46.7×70.1×4 | Si | 30 |
| 45x70x4 | Si | 30 |
| 43x63x4 | Si | 30 |
| 42x65x2 | Si | 30 |
| 60x80x4 | Si | 40 |
| 47x76x5 | Si | 40 |
